
{"id":16864,"date":"2022-10-26T10:22:10","date_gmt":"2022-10-26T10:22:10","guid":{"rendered":"https:\/\/iiser.ntc-us.com\/iisernew\/?p=16864"},"modified":"2022-11-04T14:05:16","modified_gmt":"2022-11-04T14:05:16","slug":"maskless-lithography-system-microlight-3d","status":"publish","type":"post","link":"https:\/\/iiser.ntc-us.com\/iisernew\/maskless-lithography-system-microlight-3d\/","title":{"rendered":"Maskless Lithography system (Microlight 3D)"},"content":{"rendered":"<p>This system can expose laser beam (385 nm) and pattern UV curable polymers to spatial resolution as small as 3 micrometer. It is used for microfabrication. Smart Print UV is a maskless lithography equipment, based on a DMD projection technology, compatible with a wide range of resists and substrates. Smart Print UV can produce any 2D shapes at micron resolution without the need for a hard mask. Smart Print UV is perfectly designed for any application fields requiring surface micro patterning such as microfluidics, biotechnologies and microelectronics.<\/p>\n<p>Faculty coordinator: Dr. Dileep Mampallil<\/p>\n","protected":false},"excerpt":{"rendered":"<p>This system can expose laser beam (385 nm) and pattern UV curable polymers to spatial resolution as small as 3 micrometer. It is used for microfabrication. Smart Print UV is a maskless lithography equipment, based on a DMD projection technology, compatible with a wide range of resists and substrates. Smart Print UV can produce any&hellip; <a class=\"more-link\" href=\"https:\/\/iiser.ntc-us.com\/iisernew\/maskless-lithography-system-microlight-3d\/\">Continue reading <span class=\"screen-reader-text\">Maskless Lithography system (Microlight 3D)<\/span><\/a><\/p>\n","protected":false},"author":8,"featured_media":17113,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_expiration-date-status":"","_expiration-date":0,"_expiration-date-type":"","_expiration-date-categories":[],"_expiration-date-options":[]},"categories":[23,43],"tags":[],"acf":[],"_links":{"self":[{"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/posts\/16864"}],"collection":[{"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/users\/8"}],"replies":[{"embeddable":true,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/comments?post=16864"}],"version-history":[{"count":1,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/posts\/16864\/revisions"}],"predecessor-version":[{"id":16865,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/posts\/16864\/revisions\/16865"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/media\/17113"}],"wp:attachment":[{"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/media?parent=16864"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/categories?post=16864"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/iiser.ntc-us.com\/iisernew\/wp-json\/wp\/v2\/tags?post=16864"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}